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真空镀膜机主要指一类需要在较高真空度下进行的镀膜，具体包括很多种类，包括真空离子蒸发，磁控溅射，MBE分子束外延，PLD激光溅射沉积等很多种。主要思路是分成蒸发和溅射两种。 Vacuum coating machine mainly refers to a kind of coating that needs to be carried out under high vacuum. It includes many kinds, including vacuum ion evaporation, magnetron sputtering, MBE molecular beam epitaxy, PLD laser sputtering deposition and so on. The main idea is to be divided into two kinds of evaporation and sputtering. 需要镀膜的被称为基片，镀的材料被称为靶材。 基片与靶材同在真空腔中。 The coating is called the substrate, and the plated material is called the target. The substrate and the target are in the vacuum chamber. 蒸发镀膜一般是加热靶材使表面组分以原子团或离子形式被蒸发出来。并且沉降在基片表面，通过成膜过程（散点－岛状结构-迷走结构-层状生长）形成薄膜。 对于溅射类镀膜，可以简单理解为利用电子或高能激光轰击靶材，并使表面组分以原子团或离子形式被溅射出来，并且最终沉积在基片表面，经历成膜过程，最终形成薄膜。 The evaporation coating is generally heated target to make the surface components evaporated in the form of atomic mass or ion. The film is formed on the surface of the substrate by the film forming process (scattered point island like structure - lamellar growth). For sputtering coating, it can be simply understood that the target is bombarded by electrons or high-energy laser, and the surface components are spun out in the form of atoms or ions, and finally deposited on the substrate surface, and then undergo the film-forming process, and finally form the thin film.