PVD镀膜的具体原理是什么?
PVD镀膜的具体原理是什么?
What is the principle of PVD coating?
离子镀膜(PVD镀膜)技术,其原理是在真空条件下,采用低电压、大电流的电弧放电技术,利用气体放电使靶材蒸发并使被蒸发物质电离,在电场的作用下,使被蒸发物质或其反应产物沉积在工件上。
The principle of PVD technology is to use arc discharge technology with low voltage and high current under vacuum condition to evaporate the target material and ionize the evaporated material. Under the action of electric field, the evaporated material or its reaction product is deposited on the work piece.